DSpace at KIST

Browsing bySubjectNICKEL SILICIDE LAYERS

Jump to:
All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
가 나 다 라 마 바 사 아 자 차 카 타 파 하
  • Sort by:
  • In order:
  • Results/Page
  • Authors/Record:

Showing results 1 to 1 of 1

Issue DateTitleAuthor(s)
2003-07-29Effect of Cl/H input ratio on the growth rate of MOSi2 coatings formed by chemical vapor deposition of Si on Mo substrates from SiCl4-H-2 precursor gasesYoon, JK; Kim, GH; Byun, JY; Lee, JK; Yoon, HS; Hong, KT
1

BROWSE