Showing results 1 to 1 of 1
| Issue Date | Title | Author(s) |
|---|---|---|
| - | Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists | KANG JONG HEE; 신중한; 이재형; Kim Jun Woo; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk; 박재근; 문성윤; 문봉석 |