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Issue DateTitleAuthor(s)
-Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresistsKANG JONG HEE; 신중한; 이재형; Kim Jun Woo; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk; 박재근; 문성윤; 문봉석

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