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Showing results 1 to 3 of 3

Issue DateTitleAuthor(s)
-Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresistsKANG JONG HEE; 신중한; 이재형; Kim Jun Woo; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk; 박재근; 문성윤; 문봉석
-Synthesis and properties of polynorborneneimides for single-component photoimaging systems신중한; 이찬우; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk
-t-BOC protected alicyclic polymers for applications as high resolution ArF photoresistsKANG JONG HEE; 신중한; 이재형; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk
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