Showing results 1 to 3 of 3
Issue Date | Title | Author(s) |
---|---|---|
- | Effects of current wave forms and current densities on the electroplated Cu interconnection in damascene plating | 이유용; PARK YOUNG JOON; Cho Byung Won; 이재봉 |
2002-08 | Effects of leveler on the trench filling during damascene copper plating | 이유용; 박영준; 이재봉; 조병원 |
2001-12 | The electrochemical characteristics of mercapto compounds on the copper electroplating | 손상기; 이유용; 조병원; 이재봉; 이태희 |