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Showing results 1 to 6 of 6

Issue DateTitleAuthor(s)
2015-07Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltageJeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Kim, Sang Hyun; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2014-12Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 filmsJeon, Woojin; Lee, Woongkyu; Yoo, Yeon Woo; An, Cheol Hyun; Han, Jeong Hwan; Kim, Seong Keun; Hwang, Cheol Seong
2014-05-28Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin FilmsJeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; Yoo, Yeon Woo; An, Cheol Hyun; Jung, Kwang Hwan; Kim, Seong Keun; Hwang, Cheol Seong
2014-12-20Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 FilmJeon, Woojin; Yoo, Sijung; Kim, Hyo Kyeom; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2014-12-24Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo ElectrodesYoo, Yeon Woo; Jeon, Woojin; Lee, Woongkyu; An, Cheol Hyun; Kim, Seong Keun; Hwang, Cheol Seong
2017-09-28Ta-Doped SnO2 as a reduction-resistant oxide electrode for DRAM capacitorsCho, Cheol Jin; Noh, Myoung-Sub; Lee, Woo Chul; An, Cheol Hyun; Kang, Chong-Yun; Hwang, Cheol Seong; Kim, Seong Keun
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