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Issue DateTitleAuthor(s)
2017-09-12Electrical properties and thermal stability in stack structure of HfO2/Al2O3/InSb by atomic layer depositionBaik, Min; Kang, Hang-Kyu; Kang, Yu-Seon; Jeong, Kwang-Sik; An, Youngseo; Choi, Seongheum; Kim, Hyoungsub; Song, Jin-Dong; Cho, Mann-Ho
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