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Issue DateTitleAuthor(s)
2012-09Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial LayersJung, Hyung-Suk; Yu, Il-Hyuk; Kim, Hyo Kyeom; Lee, Sang Young; Lee, Joohwi; Choi, Yujin; Chung, Yoon Jang; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong
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