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Issue DateTitleAuthor(s)
2018-08-30Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl-2 + Ar inductively coupled plasma with various HBr/Cl-2 mixing ratiosKim, Changmok; Efremov, Alexander; Lee, Jaemin; Han, Il Ki; Kim, Young-Hwan; Kwon, Kwang-Ho
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