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Browsing byAuthorHarada, Ryosuke

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Showing results 1 to 3 of 3

Issue DateTitleAuthor(s)
2023-07Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer DepositionChung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun
2025-03Selective Surface Passivation for Ultrathin and Continuous Metallic Films via Atomic Layer DepositionKim, Han; Kim, Taeseok; Kim, Min Seok; Jeon, Jihoon; Park, Gwang Min; Kim, SungChul; Won, Sung Ok; Harada, Ryosuke; Kim, Sangtae; Kim, Seong Keun
2024-11Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and EtchingKim, Han; Kim, Taeseok; Chung, Hong Keun; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Kim, Sangtae; Kim, Seong Keun
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