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Showing results 1 to 4 of 4

Issue DateTitleAuthor(s)
2025-01Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness LimitationsKim, Taeseok; Kim, Han; Ryu, Seung Ho; Park, Gwang Min; Kim, Sung-Chul; Lee, Sung Kwang; Chung, Taek-Mo; Won, Sung Ok; Han, Jeong Hwan; Kim, Sangtae; Kim, Seong Keun
2025-03Selective Surface Passivation for Ultrathin and Continuous Metallic Films via Atomic Layer DepositionKim, Han; Kim, Taeseok; Kim, Min Seok; Jeon, Jihoon; Park, Gwang Min; Kim, SungChul; Won, Sung Ok; Harada, Ryosuke; Kim, Sangtae; Kim, Seong Keun
2024-11Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and EtchingKim, Han; Kim, Taeseok; Chung, Hong Keun; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Kim, Sangtae; Kim, Seong Keun
2025-01Ultrahigh field-effect mobility of 147.5？cm2/Vs in ultrathin In2O3 transistors via passivating the surface of polycrystalline HfO2 gate dielectricsKim, Taikyu; Ryu, Seung Ho; Jeon, Jihoon; Kim, Taeseok; Baek, In-Hwan; Kim, Seong Keun
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