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Showing results 1 to 2 of 2

Issue DateTitleAuthor(s)
2024-07Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reactionHa, Min-Ji; Kang, Na-Gyeong; Kim, Woo-Hee; Park, Tae Joo; Park, Tae-Eon; Ahn, Ji-Hoon
2017-11-29Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 NanopatternsSeo, Seunggi; Yeo, Byung Chul; Han, Sang Soo; Yoon, Chang Mo; Yang, Joon Young; Yoon, Jonggeun; Yoo, Choongkeun; Kim, Ho-jin; Lee, Yong-baek; Lee, Su Jeong; Myoung, Jae-Min; Lee, Han-Bo-Ram; Kim, Woo-Hee; Oh, Il-Kwon; Kim, Hyungjun
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