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Showing results 1 to 2 of 2

Issue DateTitleAuthor(s)
-Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresistsKANG JONG HEE; 신중한; 이재형; Kim Jun Woo; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk; 박재근; 문성윤; 문봉석
-(Undefined)이재관; 윤준진; Kim Jun Woo; 황윤진; 김양일; BAE EUN HEE; Lee Chong Won
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