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Issue DateTitleAuthor(s)
2016-05Thermally Induced Tensile Strain of Epitaxial Ge Layers Grown by a Two-Step e-Beam Evaporation Process on Si SubstratesKi, Bugeun; Kim, Kyung Ho; Kim, Hyungjun; Lee, Chulwon; Cho, Yong-Hoon; Oh, Jungwoo
1

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