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Issue DateTitleAuthor(s)
1996-05Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallizationHwang, ST; Shim, I; Lee, KO; Kim, KS; Kim, JH; Choi, GJ; Cho, YS; Choi, H
1

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