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Showing results 1 to 10 of 10

Issue DateTitleAuthor(s)
2015-07Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltageJeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Kim, Sang Hyun; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2013-03-26Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal-Insulator-Metal CapacitorsLee, Woongkyu; Han, Jeong Hwan; Jeon, Woojin; Yoo, Yeon Woo; Lee, Sang Woon; Kim, Seong Keun; Ko, Chang-Hee; Lansalot-Matras, Clement; Hwang, Cheol Seong
2014-12Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 filmsJeon, Woojin; Lee, Woongkyu; Yoo, Yeon Woo; An, Cheol Hyun; Han, Jeong Hwan; Kim, Seong Keun; Hwang, Cheol Seong
2021-05-06Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thin films on Ge substrateKim, Dong Gun; Kim, Hae-Ryoung; Kwon, Dae Seon; Lim, Junil; Seo, Haengha; Kim, Tae Kyun; Paik, Heewon; Lee, Woongkyu; Hwang, Cheol Seong
2014-05-28Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin FilmsJeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; Yoo, Yeon Woo; An, Cheol Hyun; Jung, Kwang Hwan; Kim, Seong Keun; Hwang, Cheol Seong
2014-12-20Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 FilmJeon, Woojin; Yoo, Sijung; Kim, Hyo Kyeom; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2013-12Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materialsLee, Sang Woon; Choi, Byung Joon; Eom, Taeyong; Han, Jeong Hwan; Kim, Seong Keun; Song, Seul Ji; Lee, Woongkyu; Hwang, Cheol Seong
2018-12-28MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitorsLee, Woongkyu; Cho, Cheol Jin; Lee, Woo Chul; Hwang, Cheol Seong; Chang, Robert P. H.; Kim, Seong Keun
2016-02-02Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phasesLee, Woongkyu; Yoo, Sijung; Yoon, Kyung Jean; Yeu, In Won; Chang, Hye Jung; Choi, Jung-Hae; Hoffmann-Eifert, Susanne; Waser, Rainer; Hwang, Cheol Seong
2014-12-24Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo ElectrodesYoo, Yeon Woo; Jeon, Woojin; Lee, Woongkyu; An, Cheol Hyun; Kim, Seong Keun; Hwang, Cheol Seong
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