Showing results 1 to 1 of 1
Issue Date | Title | Author(s) |
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2005-04 | Effects of interfacial NH3/N2O-plasma treatment on the structural and electrical properties of ultra-thin HfO2 gate dielectrics on p-Si substrates | Maikap, S; Lee, JH; Mahapatra, R; Pal, S; No, YS; Choi, WK; Ray, SK; Kim, DY |