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Issue Date | Title | Author(s) |
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2012-04-30 | The charge trapping characteristics of Si3N4 and Al2O3 layers on amorphous-indium-gallium-zinc oxide thin films for memory application | Jung, Ji Sim; Rha, Sang-Ho; Kim, Un Ki; Chung, Yoon Jang; Jung, Yoon Soo; Choi, Jung-Hae; Hwang, Cheol Seong |