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Issue DateTitleAuthor(s)
2024-09Wide process temperature of atomic layer deposition for In2O3 thin-film transistors using novel indium precursor (N,N'-di-tert butylacetimidamido)dimethyllindiumLee, Ju-Hun; Kang, Seung-Youl; Yeon, Changbong; Yang, Jong-Heon; Jung, Jaesun; Tan, Kok Chew; Kim, Kitae; Yi, Yeonjin; Park, Soohyung; Hwang, Chi-Sun; Moon, Jaehyun
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