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Issue DateTitleAuthor(s)
2016-01High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrateSeok, Tae Jun; Cho, Young Jin; Jin, Hyun Soo; Kim, Dae Hyun; Kim, Dae Woong; Lee, Sang-Moon; Park, Jong-Bong; Won, Jung-Yeon; Kim, Seong Keun; Hwang, Cheol Seong; Park, Tae Joo
1

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