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Issue DateTitleAuthor(s)
2023-09Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasmaYang, Hae Lin; Kim, Tae-Yeon; Park, Gi-Beom; Yoon, Ara; Song, Ki-cheol; Lee, Yeonhee; Park, Jongryul; Kang, Taehyeong; Park, Yongjoo; Park, Jin-Seong
1

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