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dc.contributor.authorA. Khodin-
dc.contributor.authorLee, Joong Kee-
dc.contributor.authorChang-Sam Kim-
dc.contributor.authorValery Zalesski-
dc.contributor.authorVjacheslav Kovalevsk-
dc.contributor.authorPavel Romanov-
dc.date.accessioned2024-01-13T04:33:17Z-
dc.date.available2024-01-13T04:33:17Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/102655-
dc.languageEnglish-
dc.subjectThi film-
dc.subjectVanadium oxide-
dc.subjectDeposition-
dc.subjectoxidation-
dc.subjectResitivity-
dc.subjectSecondary battery-
dc.titleIn situ Control of vanadium oxide Films Formation under Post-deposition Oxidation-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation17th World Interfinish Congress & Exposition(INTERFINISH 2008), pp.356-
dc.citation.title17th World Interfinish Congress & Exposition(INTERFINISH 2008)-
dc.citation.startPage356-
dc.citation.endPage356-
dc.citation.conferencePlaceKO-
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