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dc.contributor.authorAhn, Kwang-Duk-
dc.contributor.authorKANG, JONG HEE-
dc.date.accessioned2024-01-13T07:31:51Z-
dc.date.available2024-01-13T07:31:51Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/104148-
dc.languageEnglish-
dc.subjectFluorescent Patterning-
dc.subjectpolymer photoimaging-
dc.subjectQuinizarin Dye Precursors-
dc.subjectDry Process-
dc.subjectprotected quinizarin styrene-
dc.subjectPhotolithography-
dc.subjectChemical Amplification-
dc.titlePhotolithographic Fluorescent Patterning with Polymers Having Quinizarin Dye Precursors Based on Chemical Amplification by Dry Process-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationIUPAC International Symposium on Advanced Polymers for Emerging Technologies, PSK30, pp.184-
dc.citation.titleIUPAC International Symposium on Advanced Polymers for Emerging Technologies, PSK30-
dc.citation.startPage184-
dc.citation.endPage184-
dc.citation.conferencePlaceKO-
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