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dc.contributor.authorLee, Byung Chul-
dc.contributor.authorSung-Il Chang-
dc.contributor.authorJun-Bo Yoon-
dc.date.accessioned2024-01-13T07:32:02Z-
dc.date.available2024-01-13T07:32:02Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/104161-
dc.languageEnglish-
dc.subjectEdge bead-
dc.subjectEdge extension chuck-
dc.subjectLIGA-
dc.subjectMEMS-
dc.subjectPhotolithography-
dc.subjectSpin coating-
dc.subjectThick photoresist-
dc.titleComplete Prevention of Edge Bead Effect in Thick Photoresist for Cost-effective MEMS Process-
dc.title.alternativeMEMS process 비용 절감을 위한 두꺼운 포토레지스트에서 완전한 에지 비드 효과 방지-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation제 8회 한국 MEMS 학술대회 논문집(2006년 4월 6-8일), pp.528 - 532-
dc.citation.title제 8회 한국 MEMS 학술대회 논문집(2006년 4월 6-8일)-
dc.citation.startPage528-
dc.citation.endPage532-
dc.citation.conferencePlaceKO-
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