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dc.contributor.authorH. S. Kim-
dc.contributor.authorJ. H. Suh-
dc.contributor.authorC. G. Park-
dc.contributor.authorS. J. Lee-
dc.contributor.authorS. K. Noh-
dc.contributor.authorSONG, JIN-DONG-
dc.contributor.authorPark, Young Ju-
dc.contributor.authorChoi, Won Jun-
dc.contributor.authorLee, Jung Il-
dc.date.accessioned2024-01-13T08:34:03Z-
dc.date.available2024-01-13T08:34:03Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/104831-
dc.languageEnglish-
dc.subjectquantum dot-
dc.subjectHi resolution electron tunneling microscopy-
dc.subjectthermal stability-
dc.titleIn situ HREM study on the thermal stability of atomic layer epitaxy grown InAs/GaAs quantum dots-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationMaterials Research society symposium proceedings, Sanfrancisco March 28-April 1 2005, v.839, pp.P.7.10.1 - P.7.10.6-
dc.citation.titleMaterials Research society symposium proceedings, Sanfrancisco March 28-April 1 2005-
dc.citation.volume839-
dc.citation.startPageP.7.10.1-
dc.citation.endPageP.7.10.6-
dc.citation.conferencePlaceUS-
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