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dc.contributor.authorSHIN, SUN IL-
dc.contributor.authorKwon Young Suk-
dc.contributor.authorKim, Seong Il-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorJung Ho Park-
dc.date.accessioned2024-01-13T10:03:16Z-
dc.date.available2024-01-13T10:03:16Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105566-
dc.languageEnglish-
dc.titleDevelopment of Etch Stop Process by Using Selective Dry Etching of SrBi2Ta2O9/Y2O3-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationThe 11th Korean Conference on Semiconductors, v.2, pp.449 - 450-
dc.citation.titleThe 11th Korean Conference on Semiconductors-
dc.citation.volume2-
dc.citation.startPage449-
dc.citation.endPage450-
dc.citation.conferencePlaceKO-
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