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dc.contributor.authorHur Jae Sung-
dc.contributor.authorChoi Hoon Sang-
dc.contributor.authorJong-Han Lee-
dc.contributor.authorChoi In Hoon-
dc.contributor.authorMoon, Sung Wook-
dc.contributor.authorShin, Hyun Joon-
dc.date.accessioned2024-01-13T10:31:13Z-
dc.date.available2024-01-13T10:31:13Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105702-
dc.languageEnglish-
dc.subjectferroelectric-
dc.subjectcapacitor-
dc.subjectIridium oxide-
dc.subjectelectrode-
dc.titleDeposition of Iridium Oxide Thin Films as Bottom Electrodes of Ferroelectric Capacitors-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationISAEM 2003 (3rd Inter. Sympo. on Designing, Processing and Properties of Advanced Engineering Materi, pp.243-
dc.citation.titleISAEM 2003 (3rd Inter. Sympo. on Designing, Processing and Properties of Advanced Engineering Materi-
dc.citation.startPage243-
dc.citation.endPage243-
dc.citation.conferencePlaceKO-
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