Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Yong Tae | - |
| dc.contributor.author | Hyun Sang Sim | - |
| dc.contributor.author | Kim, Seong Il | - |
| dc.date.accessioned | 2024-01-13T10:34:22Z | - |
| dc.date.available | 2024-01-13T10:34:22Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/105910 | - |
| dc.language | English | - |
| dc.title | A new atomic layer deposition of tungsten nitride diffusion barrier with NH₃ pulse plasma and WF6 gas | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | 203rd Meeting of the Electrochemical Society, pp.no.408 | - |
| dc.citation.title | 203rd Meeting of the Electrochemical Society | - |
| dc.citation.startPage | no.408 | - |
| dc.citation.endPage | no.408 | - |
| dc.citation.conferencePlace | FR | - |
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