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dc.contributor.authorHyun Sang Sim-
dc.contributor.authorHyeongtag Jeon-
dc.contributor.authorKim, Seong Il-
dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-13T11:01:00Z-
dc.date.available2024-01-13T11:01:00Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105954-
dc.languageEnglish-
dc.titleImprovement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer deposition-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationThe 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Mate, pp.211-
dc.citation.titleThe 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Mate-
dc.citation.startPage211-
dc.citation.endPage211-
dc.citation.conferencePlaceKO-
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