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dc.contributor.author김형권-
dc.contributor.author옥성해-
dc.contributor.authorKIM JAE HUN-
dc.contributor.authorKim Sun Ho-
dc.contributor.authorByun Young Tae-
dc.contributor.author한상국-
dc.contributor.author우형주-
dc.date.accessioned2024-01-13T11:33:02Z-
dc.date.available2024-01-13T11:33:02Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/106353-
dc.languageEnglish-
dc.subject양성자 이온 주입-
dc.subjectSOI-
dc.subjectBlister 형성-
dc.subject열처리-
dc.titleBlistering study on hydrogen ion implanted Si surface-
dc.title.alternative양성자 이온 주입에 의한 Si 표면의 blistering 연구-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation제 10 회 광전자 및 광통신 학술회의 (COOC 2003), pp.469 - 470-
dc.citation.title제 10 회 광전자 및 광통신 학술회의 (COOC 2003)-
dc.citation.startPage469-
dc.citation.endPage470-
dc.citation.conferencePlaceKO-
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