DSpace at KIST: Pulse plasma enhanced atomic layer deposition of tungsten nitride thin film

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DC Field	Value	Language
dc.contributor.author	Kim Yong Tae	-
dc.date.accessioned	2024-01-13T13:00:23Z	-
dc.date.available	2024-01-13T13:00:23Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/106981	-
dc.language	English	-
dc.subject	pulse plasma	-
dc.subject	PPALD	-
dc.subject	WF6	-
dc.subject	NH3	-
dc.subject	1000마이크로오옴	-
dc.subject	저저항	-
dc.subject	Cu확산방지	-
dc.title	Pulse plasma enhanced atomic layer deposition of tungsten nitride thin film	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	2002 대한금속·재료학회 춘계학술대회, pp.47	-
dc.citation.title	2002 대한금속·재료학회 춘계학술대회	-
dc.citation.startPage	47	-
dc.citation.endPage	47	-
dc.citation.conferencePlace	KO	-

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