DSpace at KISTKIST Conference PaperOthers

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dc.contributor.authorA. Wakahara-
dc.contributor.authorA. V. Singh-
dc.contributor.authorH. Okada-
dc.contributor.authorH. J. Kim-
dc.contributor.authorKim Yong Tae-
dc.contributor.authorA. Yoshida-
dc.date.accessioned2024-01-13T13:34:28Z-
dc.date.available2024-01-13T13:34:28Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/107507-
dc.languageEnglish-
dc.subjectZnO-
dc.titleFabrication of p-type ZnO thin films by rf-sputtering-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProceeding of International conference on Elctrical Engineering, v.3, pp.1588 - 1591-
dc.citation.titleProceeding of International conference on Elctrical Engineering-
dc.citation.volume3-
dc.citation.startPage1588-
dc.citation.endPage1591-
dc.citation.conferencePlaceCC-
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