Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | A. Wakahara | - |
| dc.contributor.author | A. V. Singh | - |
| dc.contributor.author | H. Okada | - |
| dc.contributor.author | H. J. Kim | - |
| dc.contributor.author | Kim Yong Tae | - |
| dc.contributor.author | A. Yoshida | - |
| dc.date.accessioned | 2024-01-13T13:34:28Z | - |
| dc.date.available | 2024-01-13T13:34:28Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/107507 | - |
| dc.language | English | - |
| dc.subject | ZnO | - |
| dc.title | Fabrication of p-type ZnO thin films by rf-sputtering | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | Proceeding of International conference on Elctrical Engineering, v.3, pp.1588 - 1591 | - |
| dc.citation.title | Proceeding of International conference on Elctrical Engineering | - |
| dc.citation.volume | 3 | - |
| dc.citation.startPage | 1588 | - |
| dc.citation.endPage | 1591 | - |
| dc.citation.conferencePlace | CC | - |
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