DSpace at KIST: Synthesis and application of a new Ti precursor, Ti(MPD)(MDOP) ₂ for the metal-organic chemical vapor deposition of TiO ₂ thin films

Full metadata record

DC Field	Value	Language
dc.contributor.author	Woo Kyoungja	-
dc.contributor.author	홍성호	-
dc.contributor.author	이완인	-
dc.date.accessioned	2024-01-13T14:02:07Z	-
dc.date.available	2024-01-13T14:02:07Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/107629	-
dc.language	English	-
dc.subject	Ti precursor	-
dc.title	Synthesis and application of a new Ti precursor, Ti(MPD)(MDOP) ₂ for the metal-organic chemical vapor deposition of TiO ₂ thin films	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	The Second Asian Conference on Chemical Vapor Deposition, pp.219 - 221	-
dc.citation.title	The Second Asian Conference on Chemical Vapor Deposition	-
dc.citation.startPage	219	-
dc.citation.endPage	221	-
dc.citation.conferencePlace	KO	-

Show Simple Item Record

KIST Library Institutional Repository