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dc.contributor.authorYoon Young Soo-
dc.contributor.author전은정-
dc.contributor.authorNAM SANG CHUL-
dc.contributor.authorCho Won Il-
dc.date.accessioned2024-01-13T15:31:54Z-
dc.date.available2024-01-13T15:31:54Z-
dc.date.created2021-09-29-
dc.identifier.issn1091-8213-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108393-
dc.languageEnglish-
dc.subjectvanadium oxide-
dc.titleStructural and electrochemical properties of vanadium oxide deposited by d.c. and r.f. reactive sputtering at room temperature-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 197th Meeting of the Electrochemical Society, v.2000, no.1, pp.42-
dc.citation.titleThe 197th Meeting of the Electrochemical Society-
dc.citation.volume2000-
dc.citation.number1-
dc.citation.startPage42-
dc.citation.endPage42-
dc.citation.conferencePlaceUS-
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KIST Conference Paper > Others
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