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dc.contributor.author김동준-
dc.contributor.author심현상-
dc.contributor.authorKim Yong Tae-
dc.contributor.author박종완-
dc.date.accessioned2024-01-13T15:32:16Z-
dc.date.available2024-01-13T15:32:16Z-
dc.date.created2021-09-29-
dc.identifier.issn1091-8213-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108414-
dc.languageEnglish-
dc.subjectlow-k-
dc.subjectW-B-N-
dc.subjectHSQ-
dc.subjectplasma treatment-
dc.titleEffect of NH3 plasma treatment on improvement of reliability of W-B-N/HSQ thin films-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 197th Meeting of the Electrochemical Society-
dc.citation.titleThe 197th Meeting of the Electrochemical Society-
dc.citation.conferencePlaceCN-
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