DSpace at KIST: A drastic change in structure and property of TiO₂ thin films deposited by metal-organic chemical vapor deposition with deposition temperature

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DC Field	Value	Language
dc.contributor.author	박정훈	-
dc.contributor.author	홍국선	-
dc.contributor.author	Cho Woon Jo	-
dc.date.accessioned	2024-01-13T15:34:38Z	-
dc.date.available	2024-01-13T15:34:38Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/108559	-
dc.language	English	-
dc.subject	TiO₂	-
dc.subject	thin film	-
dc.subject	chemical vapor deposition	-
dc.title	A drastic change in structure and property of TiO₂ thin films deposited by metal-organic chemical vapor deposition with deposition temperature	-
dc.type	Conference	-
dc.description.journalClass	1	-
dc.identifier.bibliographicCitation	Material Research Society, pp.160 - 161	-
dc.citation.title	Material Research Society	-
dc.citation.startPage	160	-
dc.citation.endPage	161	-
dc.citation.conferencePlace	US	-

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