Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn Kwang-Duk | - |
| dc.date.accessioned | 2024-01-13T16:00:26Z | - |
| dc.date.available | 2024-01-13T16:00:26Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/108584 | - |
| dc.language | English | - |
| dc.title | Advances in photosensitive organic resist materials for semiconductor lithography | - |
| dc.title.alternative | 반도체 미세가공기술의 발전과 유기 감광재료 | - |
| dc.type | Conference | - |
| dc.description.journalClass | 2 | - |
| dc.identifier.bibliographicCitation | 유기재료화학 특별 심포지움 ( 대한화학회 ), pp.? | - |
| dc.citation.title | 유기재료화학 특별 심포지움 ( 대한화학회 ) | - |
| dc.citation.startPage | ? | - |
| dc.citation.endPage | ? | - |
| dc.citation.conferencePlace | KO | - |
- Appears in Collections:
- KIST Conference Paper > Others
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