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dc.contributor.authorLee Jung Il-
dc.contributor.authorJ. Brini-
dc.contributor.authorA. Chovet-
dc.contributor.authorC.A. Dimitriadis-
dc.date.accessioned2024-01-13T16:34:12Z-
dc.date.available2024-01-13T16:34:12Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109084-
dc.languageEnglish-
dc.subjectlow frequency noise-
dc.subjectsemiconductor-
dc.subjectnoise spectroscopy-
dc.subjectthermal activation-
dc.titleNoise spectroscopy for semiconductor structures-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationProceedings of the 3rd Korea-China Joint Workshop on Advanced Materials, pp.329 - 333-
dc.citation.titleProceedings of the 3rd Korea-China Joint Workshop on Advanced Materials-
dc.citation.startPage329-
dc.citation.endPage333-
dc.citation.conferencePlaceKO-
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