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dc.contributor.authorKim Yong Tae-
dc.contributor.authorPARK YOUNG KYUN-
dc.contributor.author신동석-
dc.contributor.author최훈상-
dc.contributor.author최인훈-
dc.date.accessioned2024-01-13T17:30:45Z-
dc.date.available2024-01-13T17:30:45Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109404-
dc.languageEnglish-
dc.subjectstrontium tantalum ethoxide-
dc.titleCharacteristics of SrTa2Bi2O9 thin films grown by MOCVD using a new strontium tantalum ethoxide (Sr[Ta(OEt)6]2) source-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation제 46 회 응용물리학관계연합강연회 강연예고집, v.2, no.2, pp.578-
dc.citation.title제 46 회 응용물리학관계연합강연회 강연예고집-
dc.citation.volume2-
dc.citation.number2-
dc.citation.startPage578-
dc.citation.endPage578-
dc.citation.conferencePlaceJA-
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