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dc.contributor.authorGwiy-Sang Chung-
dc.contributor.authorChin-Sung Park-
dc.contributor.authorJu Byeong Kwon-
dc.date.accessioned2024-01-13T18:00:49Z-
dc.date.available2024-01-13T18:00:49Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109672-
dc.languageEnglish-
dc.subjectanisotropic etching-
dc.subjectTMAH/IPA/pyrazine solution-
dc.subjectelectrochemical etch-stop-
dc.subjectOCP-
dc.subjectPP-
dc.subjectmicro-diaphgarm-
dc.titleFabrication of high-yield Si micro-diaphragms using electrochemical etch-stop in TMAH/IPA/pyrazine solution-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationConference on Device and Process Technologies for MEMS and Microelectronics, v.3892 (SPIE), pp.346 - 355-
dc.citation.titleConference on Device and Process Technologies for MEMS and Microelectronics-
dc.citation.volume3892 (SPIE)-
dc.citation.startPage346-
dc.citation.endPage355-
dc.citation.conferencePlaceKO-
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