Characteristics of molybdenum nitride thin film by N2+ ion implantation

Authors
김동준김익수Kim Yong Tae박종완
Citation
Materials Research Society
Keywords
molybdenum nitride; ion implantation; diffusion barrier
URI
https://pubs.kist.re.kr/handle/201004/109852
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE