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dc.contributor.authorHo Nyung Lee-
dc.contributor.authorKim Yong Tae-
dc.date.accessioned2024-01-13T18:31:31Z-
dc.date.available2024-01-13T18:31:31Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109989-
dc.languageEnglish-
dc.subjectFerroelectrics-
dc.titleEnhancement of memory window in the metal/ferroelectric/insulator/semiconductor field effect transistor-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation'98 International symposium on Application of Ferroelectric, pp.?-
dc.citation.title'98 International symposium on Application of Ferroelectric-
dc.citation.startPage?-
dc.citation.endPage?-
dc.citation.conferencePlaceSZ-
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