DSpace at KISTKIST Conference PaperOthers

Full metadata record

DC Field Value Language
dc.contributor.authorLEE JAE KAP-
dc.contributor.authorLee Wook Seong-
dc.contributor.authorEUN KWANG YONG-
dc.contributor.authorBaik Young Joon-
dc.date.accessioned2024-01-13T18:32:47Z-
dc.date.available2024-01-13T18:32:47Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110067-
dc.languageEnglish-
dc.subjectlarge area diamond deposition-
dc.titleCharacterization of thick diamond film wafer grown by multi-cathode Direct Current (DC) Plasma Assisted Chemical Vapor Deposition (PACVD)-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India, pp.7-
dc.citation.titleProc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India-
dc.citation.startPage7-
dc.citation.endPage7-
dc.citation.conferencePlaceKO-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE