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dc.contributor.authorLEE JAE KAP-
dc.contributor.authorLee Wook Seong-
dc.contributor.authorEUN KWANG YONG-
dc.contributor.authorBaik Young Joon-
dc.date.accessioned2024-01-13T18:32:47Z-
dc.date.available2024-01-13T18:32:47Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110067-
dc.languageEnglish-
dc.subjectlarge area diamond deposition-
dc.titleCharacterization of thick diamond film wafer grown by multi-cathode Direct Current (DC) Plasma Assisted Chemical Vapor Deposition (PACVD)-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India, pp.7-
dc.citation.titleProc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India-
dc.citation.startPage7-
dc.citation.endPage7-
dc.citation.conferencePlaceKO-

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