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t-BOC protected alicyclic polymers for applications as high resolution ArF photoresists

Authors

KANG JONG HEE; 신중한; 이재형; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk

Citation

한국화상학회, pp.50

URI

https://pubs.kist.re.kr/handle/201004/110284

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KIST Conference Paper > Others

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