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dc.contributor.authorSON CHANG-SIK-
dc.contributor.authorPARK YOUNG KYUN-
dc.contributor.authorKim Seong Il-
dc.contributor.authorKIM EUN KYU-
dc.contributor.author최인훈-
dc.date.accessioned2024-01-13T19:03:48Z-
dc.date.available2024-01-13T19:03:48Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110391-
dc.languageEnglish-
dc.subjectone-step maskless selective epitaxy-
dc.subjectselective epitaxy-
dc.subjectGaAs-
dc.subjectmetalorganic chemical vapor deposition-
dc.titleRole of restrained vertical growth in realizing one-step maskless selective epitaxy on patterned GaAs substrate-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국물리학회 회보 = Bulletin of the Korean Physical Society, v.16, no.2, pp.476-
dc.citation.title한국물리학회 회보 = Bulletin of the Korean Physical Society-
dc.citation.volume16-
dc.citation.number2-
dc.citation.startPage476-
dc.citation.endPage476-
dc.citation.conferencePlaceKO-
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