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dc.contributor.author김홍석-
dc.contributor.authorPARK YOUNG JOON-
dc.contributor.author최인훈-
dc.contributor.authorEUN KWANG YONG-
dc.contributor.authorBaik Young Joon-
dc.date.accessioned2024-01-13T20:34:33Z-
dc.date.available2024-01-13T20:34:33Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111237-
dc.languageEnglish-
dc.subjectheteroepitaxial growth-
dc.titleHeteroepitaxial growth of β -SiC using plasma activated methane and silane sources-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationAbstracts of the 1st Asian-European international conference on plasma surface engineering., pp.186-
dc.citation.titleAbstracts of the 1st Asian-European international conference on plasma surface engineering.-
dc.citation.startPage186-
dc.citation.endPage186-
dc.citation.conferencePlaceKO-
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