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dc.contributor.authorCHOI WON-KOOK-
dc.contributor.authorJ.S. Cho-
dc.contributor.authorH.G. Jang-
dc.contributor.authorS.K. Song-
dc.contributor.author정형진-
dc.contributor.authorKOH SEOK KEUN-
dc.date.accessioned2024-01-13T21:02:03Z-
dc.date.available2024-01-13T21:02:03Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111339-
dc.languageEnglish-
dc.titleDetermination of oxidation state of tin by photoemission and AES: using SnOx thin films grown by reactive ion assisted deposition-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 2nd Korea-Japan surface and interface symposium (Seoul, Feb. 1996), pp.?-
dc.citation.titleThe 2nd Korea-Japan surface and interface symposium (Seoul, Feb. 1996)-
dc.citation.startPage?-
dc.citation.endPage?-
dc.citation.conferencePlaceKO-
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KIST Conference Paper > Others
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