KIST Library Institutional Repository

High quality silicon-nitride thin films grown by helium plasma-enhanced chemical vapor deposition

Authors

S. Lim; S. J. Kim; Jung Jae Hoon; Ju Byeong Kwon; OH MYUNG HWAN; J. F. Wager

Citation

Technical digest of 9th international vacuum microelectronics conference, St. Petersburg, Russia., pp.406 - 410

Keywords

insulating film; field emission display

URI

https://pubs.kist.re.kr/handle/201004/111374

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML