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dc.contributor.authorKim Yong Tae-
dc.contributor.authorY. S. Kim-
dc.contributor.authorS. K. Kwak-
dc.contributor.authorC. S. Kwon-
dc.contributor.authorD. G. Jung-
dc.contributor.authorMin Suk-Ki-
dc.date.accessioned2024-01-13T21:31:25Z-
dc.date.available2024-01-13T21:31:25Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111587-
dc.languageEnglish-
dc.titleStudy on physical properties of Cu-CVD for ULSI interconnects.-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국물리학회 제 72 회 학술논문발표회, pp.?-
dc.citation.title한국물리학회 제 72 회 학술논문발표회-
dc.citation.startPage?-
dc.citation.endPage?-
dc.citation.conferencePlaceKO-
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