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dc.contributor.authorPARK YOUNG KYUN-
dc.contributor.authorB. L. Sopori-
dc.contributor.authorStefan K. Estreicher-
dc.contributor.authorX. Deng-
dc.contributor.authorJ. P. Benner-
dc.contributor.authorA. Rohatgi-
dc.contributor.authorP. Sana-
dc.contributor.authorM. A. Roberson-
dc.date.accessioned2024-01-13T22:03:28Z-
dc.date.available2024-01-13T22:03:28Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111967-
dc.languageEnglish-
dc.subjectsilicon-
dc.titleHydrogen in silicon: Current understanding of diffusion and passivation mechanisms.-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationConference record of the 24th IEEE PV specialists, v.v. II, pp.1615 - 1620-
dc.citation.titleConference record of the 24th IEEE PV specialists-
dc.citation.volumev. II-
dc.citation.startPage1615-
dc.citation.endPage1620-
dc.citation.conferencePlaceUS-
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