DSpace at KISTKIST Conference PaperOthers

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dc.contributor.authorNO TAE HWAN-
dc.contributor.authorH. C. Lee-
dc.contributor.authorS. D. Kim-
dc.contributor.authorS. H. Han-
dc.contributor.authorH. J. Kim-
dc.date.accessioned2024-01-13T22:03:41Z-
dc.date.available2024-01-13T22:03:41Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111980-
dc.languageEnglish-
dc.titleEtching characteristics of magnetic thin films by ion beam technique.-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationProceedings of the third international symposium on physics of magnetic materials (ISPMM 95), Seoul,, pp.417 - ?-
dc.citation.titleProceedings of the third international symposium on physics of magnetic materials (ISPMM 95), Seoul,-
dc.citation.startPage417-
dc.citation.endPage?-
dc.citation.conferencePlaceKO-
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